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1. Introduction

1) CVDÀÇ Á¤ÀÇ

2) CVDÀÇ ºÐ·ù

2. Thermodynamics and Kinetics

1) Equilibrium Thermodynamics of Reactions

2) Chemical Reaction Kinetics

3. Thermal CVD

1) ¾Ð·Â¿¡ µû¸¥ ºÐ·ù

2) Reactor ¿Âµµ¿¡ µû¸¥ ºÐ·ù

3) Reactor Shape¿¡ µû¸¥ ºÐ·ù

4. PECVD

1) PECVD ¿ø¸®

2) PECVD ÁõÂø ±â±¸

3) PECVDÀÇ ÀåÁ¡ ¹× ´ÜÁ¡

5. ECR PECVD

1) ECR ÇöóÁÀÇ ¿ø¸®

2) ECR PECVD ÁõÂø ±â±¸

3) ECR PECVDÀÇ ÀåÁ¡ ¹× ´ÜÁ¡

6. Photo CVD

1) Photochemical CVD

2) Laser CVD

1. Introduction
º»¹®/³»¿ë
CVD¿¡¼­ ±âüÀÇ flow´Â ÀÌ Knudsen number¿¡ ÀÇÇØ viscous, transition, molecular flow·Î ³ª´­ ¼ö ÀÖ´Ù. Knudsen number°¡ 0.01 º¸´Ù ÀÛÀº flow¸¦ viscous flow¶ó ÇÑ´Ù. ÀÌ °æ¿ì ºÐÀÚÀÇ mean free path°¡ ªÀ¸¹Ç·Î ±âü ºÐÀÚµéÀÇ »óÈ£ Ãæµ¹ÀÌ Áß¿äÇÏ°Ô µÈ´Ù. Knudsen number°¡ 1º¸´Ù Ŭ ¶§ ±âü¿Í ³»ºÎ º®ÀÇ Ãæµ¹ÀÌ Áß¿äÇÏ°Ô µÇ°í ÀÌ °ÍÀ» molecular flow¶ó°í ÇÑ´Ù. Knudsen number°¡ ±× »çÀÌ¿¡ ÀÖÀ» ¶§()¸¦ transition flow¶ó°í Çϰí ÀÌ ¶§´Â ±âü ºÐÀÚµéÀÇ »óÈ£ Ãæµ¹°ú ±âü¿Í ³»ºÎ º®ÀÇ Ãæµ¹ÀÌ ¸ðµÎ Áß¿äÇÏ°Ô µÈ´Ù.


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Reference

1. S. Sivaram, Chemical Vapor Deposition, International Thomson publishing Inc., 1987
2. M. L. Hitchman, Chemical Vapor Deposition Principle and Application,
Academic Press, 1993
3. Donald L. Smith, Thin Film Deposition, McGraw Hill Inc., 1995
4. Milton Ohring, The Materials Science of Thin Films, Academic Press, 1992




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