[공학,기술] 반도체 공학 - 반도체 공정에 관해서

_SLIDE_1_ Semiconductor-Grade Silicon Table 4.1 _SLIDE_2_ Crystal seed Molten polysilicon Heat shield Water jacket Single crystal silicon Quartz crucible Carbon heating element Crystal puller and rotation mechanism _SLIDE_3_ _SLIDE_4_ _SLIDE_5_ _SLIDE_6_ _SLIDE_7_ 8) Develop inspect 5) Post-exposure bake 6) Develop 7) Hard bake UV Light Mask 4) Alignment and Exposure Resist 2) Spin coat 3) Soft bake 1) Vapor prime HMDS _SLIDE_8_ Substrate Film Resist Resist Substrate Film _SLIDE_9_ _SLIDE_10_ CVD 이용// PVD이용 _SLIDE_11_ Upper polishing pad Lower polishing pad Wafer Slurry _SLIDE_12_ Used with permission from Advanced Micro Devices Oxidation (Field oxide) Silicon substrate Silicon dioxide oxygen Photoresist Develop oxide Photoresist Coating photoresist Mask-Wafer Alignment and Exposure Mask UV light Exposed Photoresist exposed photoresist G S D Active Regions top nitride S D G silicon nitride Nitride Dep…
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