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청문각 화공양론 3판 솔루션 (Elementary Principles Of Chemical Processes 3rd Edition , Rich-ard M. Felder , Ronald W. Roussean , wiley)
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목차/차례
- 솔루션 표지입니다!
- INSTRUCTORS MANUAL
- TO ACCOMPANY
- ELEMENTARY PRINCIPLES OF
- CHEMICAL PROCESSES
- Third Edition
- Rich-ard M. Felder
- Ronald W. Rousseau
- 콘텐츠 부분입니다.
- CONTENTS
- Notes to the Instructor iv
- Section/Problem Concordance vi
- Sample Assignment Schedule I ix
- Sample Assignment Schedule II x
- Sample Responses to a Creativity Exercise xi
- Transparency Masters xvi
- Compressibility ch-arts xvii
- Cox vapor pressure ch-art xxi
- Psychrometric ch-art – SI units xxii
- Psychrometric ch-art – American engineering units xxiii
- Enthalpy-concentration ch-art: H2SO4-H2O xxiv
- Enthalpy-concentration ch-art: NH3-H2O xxv
- Problem Solutions
- Chapter 2 2-1
- Chapter 3 3-1
- Chapter 4 4-1
- Chapter 5 5-1
- Chapter 6 6-1
- Chapter 7 7-1
- Chapter 8 8-1
- Chapter 9 9-1
- Chapter 10 10-1
- Chapter 11 11-1
- Chapter 12 (Case Study 1) 12-1
- Chapter 13 (Case Study 2) 13-1
- Chapter 14 (Case Study 3) 14-1
본문/내용
INSTRUCTOR’S MANUAL TO ACCOMPANY
ELEMENTARY PRINCIPLES OF CHEMICAL PROCESSES
Third Edition
Rich-ard M. Felder Ronald W. Rousseau
with assistance from Matthew Burke, Swapnil Chhabra, Jun Gao, Gary Huvard, Concepcion Jimenez-Gonzalez, Linda Holm, Norman Kaplan, Brian Keyes, Amit Khandelwal, Stephanie Manfredi, Janette Mendez-Santiago, Amy Michel, Dong Niu, Amitabh Sehgal, James Semler, Kai Wang, Esther Wilcox, Jack Winnick, Tao Wu, Jian Zhou
3
INSTRUCTOR’S MANUAL to accompany ELEMENTARY PRINCIPLES OF CHEMICAL PROCESSES
THIRD EDITION
RICHARD M. FELDER North Carolina State University RONALD W. ROUSSEAU Georgia Institute of Technology
JOHN WILEY & SONS New York Chichester Brisbane
Toronto
Singapore
4
CONTENTS Notes to the Instructor Section/Problem Concordance Sample Assignment Schedule I Sample Assignment Schedule II Sample Responses to a Creativity Exercise Transparency Masters Compressibility ch-arts Cox vapor pressure ch-art Psychrometric ch-art ? SI u…
ELEMENTARY PRINCIPLES OF CHEMICAL PROCESSES
Third Edition
Rich-ard M. Felder Ronald W. Rousseau
with assistance from Matthew Burke, Swapnil Chhabra, Jun Gao, Gary Huvard, Concepcion Jimenez-Gonzalez, Linda Holm, Norman Kaplan, Brian Keyes, Amit Khandelwal, Stephanie Manfredi, Janette Mendez-Santiago, Amy Michel, Dong Niu, Amitabh Sehgal, James Semler, Kai Wang, Esther Wilcox, Jack Winnick, Tao Wu, Jian Zhou
3
INSTRUCTOR’S MANUAL to accompany ELEMENTARY PRINCIPLES OF CHEMICAL PROCESSES
THIRD EDITION
RICHARD M. FELDER North Carolina State University RONALD W. ROUSSEAU Georgia Institute of Technology
JOHN WILEY & SONS New York Chichester Brisbane
Toronto
Singapore
4
CONTENTS Notes to the Instructor Section/Problem Concordance Sample Assignment Schedule I Sample Assignment Schedule II Sample Responses to a Creativity Exercise Transparency Masters Compressibility ch-arts Cox vapor pressure ch-art Psychrometric ch-art ? SI u…
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