1.1 Soft lithography
Microstructure³ª nanostructureÀ» ¸¸µé±â À§ÇÑ printing, moldingÀÇ °úÁ¤À» Æ÷ÇÔÇÏ´Â techniqueÀ¸·Î, ÀϹÝÀûÀ¸·Î printing, molding, transferÀÇ 3´Ü°è °úÁ¤À» °ÅÄ£´Ù.
1.1.1 Printing
Master¸¦ ¸¸µå´Â °úÁ¤ÀÌ´Ù. Photolithography, e-beam, micro-machining, photoresist µî ´Ù¾çÇÑ ¹æ¹ýÀ» ÅëÇØ ¿øÇÏ´Â ¸ð¾çÀ» °¡Áö´Â master¸¦ Á¦ÀÛÇÒ ¼ö ÀÖ´Ù. ±× Áß photoresist´Â light-sensitive material·Î, ƯÁ¤ geometric patternÀ» °¡Áö´Â photomask¸¦ À§¿¡ µÎ°í ºû¿¡ expose ½ÃÄÑÁÖ¸é mask°¡ µ¤ÀÎ ºÎºÐÀº ±×´ë·Î ÀÖÀ¸³ª mask°¡ µ¤ÀÌÁö ¾ÊÀº ºÎºÐÀº ºû¿¡ ±×´ë·Î ³ëÃâµÇ¾î ÇØ´ç ºÎÀ§¸¸ ±¸Á¶Àû º¯ÇüÀÌ ¹ß»ýÇÑ´Ù. PhotoresistÀÇ Á¾·ù¿¡´Â photopolymeric, photodecomposing, photocrosslinking µîÀÌ ÀÖÀ¸¸ç, ±× Áß photocrosslinking photoresist´Â ºû¿¡ exposeµÇ¾úÀ» ¶§ chain °£ cross-linkingÀÌ ¹ß»ýÇÑ´Ù. SU-8ÀÌ ±× ´ëÇ¥ÀûÀÎ ¿¹·Î, ÀÌ´Â epoxy-based negative photoresistÀÌ´Ù. µû¶ó¼ ºû¿¡ ³ëÃâµÈ ºÎºÐÀº cross-linked µÇ¾î developer¿¡ insolubleÇÏ°Ô ¹Ù²î°í, ³ª¸ÓÁö ºÎºÐÀº ±×´ë·Î solubleÇÏ¿© Á¦°ÅµÈ´Ù.
1.1.2 Molding
»ý¼ºµÈ master À§¿¡ polyu¡¦(»ý·«)
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Culbertson Ch. T., Jacobson S. C., Ramsey J. M., Diffusion coefficient measurements in microfluidic devices(56), Talanta, p. 365 (2002) Daniel C. Harris, Quantitative Chemical Analysis(8th ed.), W.H. Freeman and Company, pp. 550-551(2010) R. Martinex-Duarte, SU-8 photolithography and its impact on microfluidics, CRC Press, pp 231-268(2011) http://www.chemspider.com/FullSearch.aspx
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