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Cu2O
P-TYPE ¹ÝµµÃ¼
Band Gap 2.1~2.6eV
Simple cubic
gas sensor, electrochromic
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NiO
NaCl °ú °°Àº ¾Ï¿°±¸Á¶
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ElliosometryÀÇ ±âº»
Modeling
Optical dispersion Model
Standard cirtical point model(SCP model)
P-N junction
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Deposition
RF magnetron sputtering
Target : Cu O, Substrate : Si, SiO , Pt, Gas : Ar
2
Working pressure : 9.8E-4torr
Deposition temperature : R.T. , 200~650 by 50¡ÆC
Opti¡¦(»ý·«)
(a) »ó¿Â¼ºÀå
(b) 200¡É ¼ºÀå
(c) 300¡É ¼ºÀå
(d) 400¡É ¼ºÀå
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